JP-607A industrial microscope is developed and aimed at the semiconductor industry, wafer manufacturing, electronic information industry, metallurgical industry. Used as an advanced microscope, the user can experience its super performance when using it. It can be widely used to identify and analyze Semiconductor, FPD, Circuit encapsulation, circuit substrate, Material, Casting/Metal/Ceramic parts, Precision moulds and observe thicker specimen. High quality and reliable optical system brings much clearer and contrast image. The design meets with the ergonomics needs and makes you feel comfortable and relaxed in doing your job.

Specification
Viewing Head	Compensation Free Trinocular Head, Inclined 30°（50mm-75mm）
Eyepiece	WF10×/25mm
	WF10×/20mm,crosshair with reticule 0.1mm
Objective	Long working distance Infinite Plan Apochromatic objectives:5 ×/0.15/W.D.35mm、10×/0.28/W.D.35mm、20×/0.40/W.D.20mm、50 ×/0.55/W.D.13mm
Nosepiece	Quadruple nosepiece with center adjustable
Stage	Double layer mechanical stage
	Stage Size: 190mm×140mm
	Moving Range:50mm×40mm
Filter	Flashboard type Filters:(green,blue,neutral)
Focusing	Coaxial coarse ＆fine focusing adjustment with rack and pinion mechanism.Fine focusing scale value 0.002mm
Light Source	With aperture iris diaphragm and field iris diaphragm,halogen bulb 12V/50W, AC 85V-230V, brightness adjustable
Polarizing Device	Analyzer rotatable 360,°Polarizer＆Analyzer can be moved in/out of the optical path
Checking Tool	0.01mm Micrometer
Optional Accessory	Two-dimensional measurement software
	Professional metallurgical image analysis software
	Micrometer eyepiece
	1.3Mega、2.0 Mega、3.0 Mega,5.0 Mega pixels CMOS. Digital camera eyepieces
	Halogen Bulb 12V/100W
	Precision Stage:X-Y moving range 25mm×25mm,Moving Precision＜5um,Digital hand wheel Min.Value:0.1um,360°Rotatable disc
	Photography attachmentand CCD Adapter 0.5×、0.57×、0.75×
	Objective: 2×
	Planishing tool
	CCD Camera,colour 1/3″High resolution 520 TV lines

Characteristicsand description

1.       Adopt UIS High-resolution, Long working distance, and infinity light path

correcting system objective imaging technology.

2.       Extending the multiplexing technology of objective, compatible infinity

objective with all the observation methods.

3.       Aspherical surface Kohler illumination, increasing the viewing brightness.

4.       WF10×（Φ25）super wide viewing field Eyepiece.